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Catalog Datasheet	MFG & Type	PDF	Document Tags
ionizer Abstract: variable high voltage 65831 ioniser symposium dc corona discharge simulation Text: Comparative Study of Reticle Electrical Static Discharge under N2 purge and 40% Relative Humidity Ambient J. F. Zheng1, J. A. Montoya2, M. Chandhook3 P. Sanchez4, Giang Dao1 and Fu-Chang Lo1 1Advanced Mask Technology 2Intel Facility Technology Development	Original	PDF
Treadmill Abstract: POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm Text: 157-nm Lithography for 100-nm Node Challenges and Progress G. Dao and Y. Borodovsky Acknowledgment The Japan Electronic Journal P. Gargini, P. Silverman, F. C. Lo, A. Grenville, L. Liao, E. Panning, Orvek, and J.F. Zheng R =	Original	PDF	157-nm 100-nm Treadmill POWER SUPPLY for Treadmill ionizer teflon af asahi glass delay line u-key hydrocarbon polymeric symposium NIKON 13Nm
AN 1213 Abstract: NIKON Asahi Glass Text: 157 nm Mask Technology Development Status Update Giang Dao*a, Ronald Kuseb, Kevin Orvek a, Eric Panninga, Roswitha Remlingb, Jun Fei Zhenga, Munehiko Tsubosakic, and Fu-Chang Loa Intel Corporation, aComponents Research, bIntel Mask Operations, Santa Clara, CA 95052	Original	PDF	157-nm 100-nm 70-nm 157nm 180-nm 157-nm AN 1213 NIKON Asahi Glass
windmill design Abstract: Polyoxymethylene blind cover R6800U-26 phototube hamamatsu Text: METAL PACKAGE SOLAR BLIND PHOTOTUBE PRELIMINARY DATA AUG. 1999 R6800U-26 Compact 16 mm diameter, 12 mm seated length , solar blind (spectral response: 115 to 220 nm) The R6800U-26 is a subminiature phototube encapsulated in a TO-8 metal package. The electrode structure	Original	PDF	R6800U-26 R6800U-26 126nm 157nm SE-171-41 1010E02 windmill design Polyoxymethylene blind cover phototube hamamatsu
ipl xenon Abstract: gore membrane vents power supply for magnetron 80-wafer-per-hour schematic diagram of ip camera ,ipl xenon spy camera circuit diagram spy camera schematic diagram intel atom carl zeiss Text: MICROPROCESSOR REPORT www.MPRonline.com T H E I N S I D E R ’ S G U I D E T O M I C R O P R O C E S S O R H A R D WA R E EXTREME LITHOGRAPHY Intel Backs EUV for Next-Generation Lithography By Ke ith D ie fe ndor ff {6/19/00-01} Working at the very boundary between theoretical physics and practical engineering, scientists at Lawrence Livermore, Sandia, and Lawrence Berkeley National Laboratories	Original	PDF
EUA SOT23-8 Abstract: SO-113 MAX4255EUK Text: 19-1295; Rev 1; 1/98 A lilX I V M SOT23, Si ng l e- Suppl y, L o w -Noise, L o w - D i s t o r t i o n , R ai l - t o- Rai l Op A m p s _ F e a t u r e s The MAX4249-MAX4257 low-noise, low-distortion oper ational amplifiers offer Rail-to-Rail outputs and single	OCR Scan	PDF	MAX4249-MAX4257 MAX4249/ MAX425jx EUA SOT23-8 SO-113 MAX4255EUK